Jonas Sundqvist
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BALD Engineering - Born in Finland, Born to ALD
10 posts · theirs
Lately
Atomic Layer Etching as a Scaling Enabler: From Isotropic Chemistry to Selective, Directional, and Geometry-Driven Patterning
Intel Foundry Advances Future Logic Scaling with Manufacturable 2D Transistors and High NA EUV Integration
Nanexa and Moderna partner on ALD-based PharmaShell drug delivery platform in licensing deal with USD 3 million upfront payment
Capacitive memory built on a TSMC CMOS chip (reported in Nature)
The 2026 Area Selective Deposition Workshop (ASD 2026)
Samsung Researchers Achieve Near-Perfect Grain Orientation in Atomic Layer Deposited Ruthenium for Next-Generation Interconnects
IEDM2025 Tutorial - Atomic layer deposited atomically thin In₂O₃ transistors for BEOL logic and memory applications
Applied Materials Deepens Partnership with Besi and Launches Kinex™ – the Industry’s First Fully Integrated Die-to-Wafer Hybrid Bonding System for Next-Gen AI and Memory Chips
Plasma-Based Deposition Refines ALD for Next-Gen DRAM: 30% Higher k, 40× Lower Leakage
AlixLabs presents HAR narrow-fin patterning at ECS 248
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