Jeffrey N. Murphy, PhD is a scientist who holds a PhD in Chemistry from the University of Alberta in Edmonton, AB. His thesis focused on the analysis of nanoscale defects in block copolymer thin films, during the transition from disordered to highly ordered states. Block copolymer lithography is a technology with the potential to revolutionize the patterning of computer chips for the semiconductor industry. In order to meet extremely low tolerances on defects in order to be commercially viable.
Following his PhD, he moved to the Netherlands where he was a postdoctoral fellow at Eindhoven University of Technology (TU/e) working with functional liquid crystalline materials.
Prior to his PhD, he completed a Honours BSc in Chemistry from Simon Fraser University atop Burnaby Mountain in Burnaby, BC, followed by a MSc in Chemistry at the University of British Columbia in Vancouver, BC. The focus of his master’s thesis was on the self assembly of fluorescently labelled DNA, linked to gold electrode surfaces using thiolate anchors. These structures have potential for detecting specific DNA sequences, allowing for quick detection of pathogen DNA.
A list of his publications can be found on ORCID or on Google Scholar.