AlixLabs presents HAR narrow-fin patterning at ECS 248

AlixLabs is pleased to announce that Dr. Dmitry Suyatin, CIPO and Co-Founder, has presented the company’s latest advances in APS™ (Atomic Layer Etching Pitch Splitting) at the 248th Electrochemical Society (ECS) Meeting held in Chicago, October 12–16, 2025. During the session, Dr. Suyatin highlighted new experimental results demonstrating high-aspect-ratio (HAR), narrow-fin patterning on bulk…