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Howard Huff and Michael Riordan
© Copyright 2007 by The Electrochemical Society.
The Electrochemical Society Interface,
Volume 16,
Number 3Citation Howard Huff and Michael Riordan 2007 Electrochem. Soc. Interface 16 29DOI 10.1149/2.F02073IF
- Howard Huff
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SEMATECH
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- Michael Riordan
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Stanford University/University of California, Santa Cruz
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SEMATECH
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Stanford University/University of California, Santa Cruz
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Abstract
In September 1957, Carl Frosch and Link Derick published an epochal paper in the Journal of The Electrochemical Society entitled, “Surface Protection and Selective Masking During Diffusion in Silicon.” In it they described their 1955 discovery at Bell Labs of ways to form a silicon-dioxide layer on the surface of silicon wafers during the high-temperature diffusion process.